Eprocess Vers 1.06
- replace Accent references with Nanometrics

Eprocess Vers.1.05
- cope with corrupted raw files, bytes 8-15 (date -> ???)
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ProdProf Versions

vers 1.33.5.0
- remove DP X-Scale from ini (superfluous)
- enable SaveAs for read-in files (to save in csv format)

vers 1.33.4.0
- add test for full waste bottle before every fill (flush dialog)

vers 1.33.3.0
- add test for full waste bottle on pressing Change (flush dialog)

vers 1.33.2.0
- unlock door after drain to allow lowering in case cell doesn't move back correctly

vers 1.33.1.0
- output new lamp intensity at layer change
- read PumpMode from next layer

vers 1.33.0.0
- version bump due to new driver for Dell computer

vers 1.32.0.0
-  camera dialog off except in IV,CV,DP,EP graphs

vers 1.31.0.3
- typo corrections
- change to wideband=3 LampOn function

vers 1.31.0.2
- error trap blank lines in Ring History files
- remove Accent from EquipStatus page
- capital Next in mounting wizard

vers 1.31.0.1
- always take control of UV controller with every command
- allow 1/2 sec lamp control updating with LC8

vers 1.31.0.0
- support for LC8 UV controller
- change UV user dialog for LC8 changes
- add lamp hours to system status page (LC8)
- nanometrics logo
- nanometrics web reference
- limit lamp control back to 90%
- show/hide pulse view when changing layers
- read Imeas second time in Etch section

vers 1.30.5.1
- limit lamp control to 70% (instead of 90%)  ???One Off???

vers 1.30.5
- Ring History, enlarge undersize buffer to stop application errors.

vers 1.30.4
- at end of etch step, go to standby mode before auto-image capture

vers 1.30.3
- select on click for filtered edit controls
- Etch Meas Options, change parent class to stop dragging
- filtered edit controls, set limit text in class
- Sealing Rings dialog, subclass edit controls to filtered type (not microscope inputs)
- GaN pulse current graph - fix grey area scaling bug.

vers 1.30.2
- Mounting, selecting base name - fixed bug with overwriting existing files

vers 1.30.1
- fixed bug when saving tif formatted files (need to specify uncompressed capture buffer)

vers 1.30.0
- DP advanced setup dialog with 3-segment function

vers 1.29.3
- fix path of accent logo bitmap, shouldn't change with current directory.
- CV curve, freq display, to show the measurement value, not current system value
- Ring Name, move from recipe to ini file.  Save on close, read on start app.
- Recipe Select, add View button (loads up Notepad).
- Ring Name, expand to 64 bytes to allow electrolyte to be added.
- Info, add Ring Name to data shown

vers 1.29.2
- More items added to Sample Log as requested
- Spot Meas, can directly access Capacitance Params function.
- Spot Meas, disable Command buttons during measurement.
- CV, put Frequency data on graph.
- Multi-print, make dialog a popup, no title, and clarify text information
- Multi-print, make clipping work correctly
- Multi-print, disable button when running.
- Etch graph time/date string, rethink when to update this
- Graph printouts, comments added to all printouts
- Info button added to graph command bar to view header data.
- Activity Log, fix print button ID error.
- Activity Log, fix font size for different printers.
- Activity Log, add Accent logo to first page of printout.
- Etch Control Panel, Shift for fine Vmeas, Vetch - text added

vers 1.29.1
- improved circle fitting, using .mef and .mmf context files
- ECVision, fix file selection error (Initial Dir)
- Multi-graph printout function added
- IV Meas. Setup, fix validation error
- Etch Current Limits, change to 250 mA/cm2 for small area sealing ring operation
- Recovery dialog, test for mounted changed to AND function
- ECVision, make title changes on top bar when selecting sections

vers 1.29.0 - release version
vers 1.28.6 -- about 100 bugs fixed following exhaustive testing, including:
- ECVision forced delay until cell movement is complete
- fix auto-save-image every n-pts error
- filtered edit controls, and increased value validation
- button and edit control disabling when inapplicable
- better use of message bar

vers 1.28.5
- Recovery Dlg: override button, disable inappropriate buttons, handle Demo Mode

vers 1.28.4
- ECVision, increase radius and area display by one digit
- SampleID, don't remove extension from base name (at . char)
- Recovery Dlg, new form with extra button to continue mounted sample

vers 1.28.3
- PulseView, update Tmax scale when exiting options dynamically
- PulseView, hide window if etching mode changed.
- PulseView, make Top window in Z-order, so doesn't get clipped by graph window
- PulseView, remove I-range label.
- ECVision, add further 3 sec delay for cell to move up.

vers 1.28.2
- fix crash when selecting printer setup dialog after mounting
- fix bug getting version string
- Demount, ECVision, fix file reload function
- ECVision, disable Next button until actions are finished
- ECVision, disable Choose File button if camera radio button is selected
- Demount, unlock door in No Vacuum tab
- Demount, drain page, disable CANCEL once draining starts.
- Demount, ECVision, add clarifying text to dialog

vers 1.28.1
- Tab Dialog property sheets: check creation & cleanup of child windows
- Main: remove Alarms, Warning Tower, and Maintenance Log functions which are unused
- Camera View disable image saving on UV system during etching.
- Mounting, disable cancel button at fill dialog.
- Mounting, Sample name, remove duplicate warning about overwrite existing files.
- Etch Etching Options, change I-max label to I-range (Pulsed mode).
- Demount, quick drain - add Clean Wafer Routine after draining.
- UV lamp on, increase delay to 3 sec before opening shutter.
- Pulse View now dynamically scaled on both axes, ticks added.
- Mounting ID page, detect if door is already latched & vacuum good, then skip rest of mount.
- Flush Reagent, remove table up & cell forward operations, disable access when mounted.
- Etch Options, more parameter validation.
- Sample Log file, add software version number
- Caption, change to "ECVpro vers.1.28.1 (demo)", for example.
- Demount ECVision, add Reload button and function
- Etch Control Panel, Vetch and Vmeas increment by 5 mV if shift is held down
- Flush Reagent, add delays so that cell moves forward & back correctly

vers 1.27.10
- Pump Options: grey "Off For" edit control if not in pulsed etching mode
- Pulse View: add helping labels
- Etch Options: prevent closure of tab windows with CR or ESC
- Engineering: prevent closure of tab windows with CR or ESC

vers 1.27.9
- Recipe save, expand buffer size to avoid crashes
- Pulse View, reduce width to 100 pixels, and make child of frame window

vers 1.27.8
- Mounting Sample ID: add reload recipe button
- Flush Cell button, change name to Flush Reagent Tubing
- Day & Sample logs: correction to ECVision History entry
- Day log: add CRLF to Flushed out Electrolyte message
- Wr: don't set to zero when reading in underlay file
- Pulsed etching: new graph of Ietch for etching current pulse.

vers 1.27.7
- Etch, multilayer execution, update change of resolution correctly
- AutoSaveImage, allow for pump mode=after etch
- Multi layer, fix change to 3rd & subsequent layers

vers 1.27.6
- Etch, fix program flow error when using After-Etch circulation in non-GaN mode. 
  This resluted in doubling the apparent depth.

vers 1.27.5
- Spot log file, correct label from G to Rs
- Etch Log: Correction to point index number
- Etch Options: remove duplicate Vmeas, Vetch, Resolution setting (use control panel for these)
- Etch depth calculation, do incrementally to handle material changes during run

vers 1.27.4
- Don't draw cursor on read in IV and CV graphs
- Etching, fix possible logic flow bug
- Rationalize "Settling" display code

vers 1.27.3
- Calib Check:- initialize book variable when entering new value, and clear diff box.
- EP Etch Options:- change radio buttons so they don't wrap around using tab key
- roll back F12 change on UV, without affecting white light control

vers 1.27.2
- EP scaling, allow depth > 0.01
- CV auto-scaling, independent for each curve according to selected type
- IV, CV, DP, EP stop read-in from changing measuring ranges
- disable saving of read-in files
- Etch Options:- fix radio button selection bug
- Flush:- move cell forward/back if necessary

Vers 1.27.1
- test and fix white light operation
- improve ECVision protection of cell movement with table up
- default dV set to 0.3 V
- clarify presentation of capacitance calibration dialog
- demount - hide Lock Door button when no longer relevent

Vers.1.26.14
- remove old non-reversible circulation pump from manifold code
- prevent bias >10 volts generating errors

Vers.1.26.13
- adapt C-calibration for low freq system
- fix demount on recover initialization bug
- fix N by 1/C2 bug after a file has been read in

Vers.1.26.12
- Add Fdivide in INI file for low frequency research
- hide Generate Waves button in Engineering: Serial tab

Vers.1.26.11
- Add V-pinchoff function to CV graph
- Add FBP calculation to N line draw on CV graph

Vers.1.26.10
- Add PumpOn, PumpOff, IVdelay to recipe

Vers.1.26.9
- Wafer ID, Batch ID, Description added to Sample Log
- compression entries added to INI file
- attempt to fix main shutter staying closed after etch termination on error
- move lamp-off to earlier position when application closes (hanging process bug)

Vers.1.26.8
- don't set lamp=0 for new sample
- EP display - hide reference file actions
- EP lamp control - no alternate steps for halogen system, give faster response
- Recipe reading - omit duplicate instructions
- default amplitude increased to 100 mV
- move secret functions to popup menu (R-click on Title Bar)

Vers.1.26.7
- recipe reading, make sure pulsed etching forces the after-etch pump mode
- UV lamp on, increase delay from 1 to 2 sec before opening shutter
- fix no-recipe frequency setting bug

Vers.1.26.6
- fix camera grab when starting etching
- add dual-step DP voltage spacing to even out deep profiles
- fix some Mil error messages in ECVision
- alter pulsed anodizing to use I-end value distinct from I-limit.

Vers.1.26.5
- add wideband=x selection of LC6 types
- fix UV unit control
- use main shutter for operation control
- make lamp and camera gain spin control active-on-release
- fix duplicate user create bug
- ECVision, add warning messages about putting table up & down
- ECVision, disable image capture if cell is forward
- hide camera image when closing application (hanging process bug)

Vers.1.26.4
- allow duplicate base name after prompt
- delete dG/dV in spot meas

Vers.1.26.3
- delete log file not found error messages
- IV curve, variable speed function
- Etch options, change name to Pulsed Anodizing
- DP display options, fix error with Wd scale
- Spot, save to sample log button
- Recipe create, update current recipe name string
- All graphs, more explicit error messages for scale entry errors
- DP, add variable point voltage step selection
- remove all references to GaN
- pump after etch, make sure this works as before